Researchers at the Massachusetts Institute of Technology (MIT) have developed methods to reduce and "iron out" wrinkles in graphene, potentially enabling faster and more efficient electronic and photonic devices.
"Now we can really produce single-domain graphene at wafer scale," says MIT professor Jeewhan Kim.
Four years ago at IBM, Kim and colleagues produced wafers of single-crystalline graphene as an alternative to chemical vapor deposition. They were fabricated from silicon carbide wafers with an atomically smooth surface, which also had nanometer-scale wrinkles.
The team used a thin nickel sheet to peel off the top-most graphene layer from the silicon carbide wafer, which smoothed out the wrinkles. Prior to transferring the layer of graphene onto the silicon wafer, the team oxidized the silicon, creating a naturally electrostatic silicon dioxide layer.
Graphene deposition caused the silicon dioxide to pull graphene's carbon atoms onto the wafer, flattening out the wrinkles.
From MIT News
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